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리스트 게시판
Litho Tech Japan
Resist Analysis system
Lithography Process System

www.ltj.co.jp
RDA(ARM) Series
The Resist Development Analyzer is the most-advanced 18-channel development rate analysis evaluation equipment. Using this system, you can promptly carry out developing characteristic analysis such as measurement of photoresists development rates and calculation of contrast curves and sensitivity. You can also accurately determine resist model parameters required for the lithography simulator.
EXPOSURE SYSTEM
Exposure tool for research and development of photoresists
Exposure with G,H,I-line,KrF,ArF, EUV & E-BEAM
PR Coater & Developer
Automatic Coater/Developer/Bake system

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