| THIN FILM DEPOSITION HighTemp-350: Extends wafer temperature control monitoring for optimization of deposition processes. Lithography Process Monitoring ScannerTemp: allows highly accurate temperature monitoring of dry and immersion lithography systems, whose overlay performance is highly sensitive to thermal variation. SensArray 1840 Rev A: Instrumented wafers for real-time hot plate temperature monitoring and measurements SensArray 1850: Instrumented wafers for bake plate monitoring and characterization Integrated Wafer: Wireless, low profile wafer process monitoring system for gathering critical thermal data from semiconductor manufacturing processes Base Station 300/300Z: Central operating hub for process monitoring and uploading thermal measurement survey requirements and downloading thermal survey data iWafer Carrier Station: Communication link between the SensorWafer and host computer for process monitoring LithoSuite: Data collection and analysis system for process monitoring of lithography applications Thermal MAP: Wireless data acquisition hardware and graphical software for visualization and analysis Thermal TRACK: PC-based PDA supplies real-time process monitoring and measurements Plasma Etch Wafer Process Monitoring EtchTemp-SE (ET-SE) delivers temperature wafer process monitoring during silicon etch wafer manufacturing processes, providing precise condition temperature measurements with a higher signal-to-noise ratio than alternative methods. EtchTemp: Instrumented SensorWafer for etch wafer process monitoring and characterizing high-power, high-frequency etch recipes for 65nm nodes and below I3 Integral: SensorWafer for highly accurate measurement of plasma etch wafer temperature iWafer Carrier Station: Communication link between SensorWafer and host computer for process monitoring PlasmaSuite: Data collection and analysis system for process monitoring of plasma applications Implant and Wet Process Monitoring Implant and Wet Process Monitoring WetTemp-LP is designed to be compatible with both single wafer and batch wet clean systems that require this standard-thickness wafer form factor. i3 Integral for Implant: Capture and monitor process environment effects on production wafers and obtain accurate temperature profiles with full wafer spatial resolution monitoring I3 Integral for Wet: Instrumented wafer designed to provide critical wet processing temperature data PlasmaSuite: Data collection and analysis system for process monitoring of plasma applications Base Station 300/300Z: Central operating hub for process monitoring and uploading thermal measurement survey requirements and downloading thermal survey data iWafer Carrier Station: Communication link between the SensorWafer and host computer for process monitoring Instrumented Substrates Instrumented Substrates SensArray 1530: Instrumented wafer for cold wall, RTP, sputtering, CVD, plasma strippers and epitaxial reactors SensArray 1535: Instrumented wafer for process temperature monitoring of hot wall systems, and oxidizing cold wall environments SensArray 1630: Instrumented wafer for both front-end atmospheric and belt CVD systems, and in back-end wafer solder bumping reflow ovens SensArray 1730: Instrumented wafer for photoresist track systems, temperature-controlled wafer chuck systems, oven applications, and resist bake, polyimide, and SOG applications SensArray 20x0: Instrumented glass panels and tiles for monitoring and measuring temperature profiles for a range of flat panel processing applications Thermal MAP: Wireless data acquisition hardware and graphical software for visualization and analysis Thermal TRACK: PC-based PDA supplies real-time wafer process monitoring and measurements | 
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