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PVD Tool

AMS2000series
Deposition of Metals, Piezoelectrics and Dielectrics
Our PVD System is based on cluster tool architecture. We supply the following configuration of PVD modules:
Dual Magnetron (AC or DC powered)
Single Magnetron (DC powered)
RF diode
The PVD System is a modular cluster tool platform, which can be configured with up to 6 chambers, including a precleaning module with either an RF plasma or an Ion Mill source (for the more aggressive cleaning); and one or two Cassette Loadlock Modules.
A computer running standard Microsoft Windows software allows users to easily and intuitively operate the system.  
Our system can be easily expanded to include a combination of Trimming and IBD modules as process requirements change. The use of standardized modules and components minimizes the variety of spare parts required. 

 
 

Features:
Precise Laser Interferometer Thickness Control
Water cooled lifter drive or wafer rotation mechanism
Cooling or Heating chucks
Substrate RF bias
Advantages:
Our unique mechanism for adjusting the magnetic field helps control film uniformity and stress
Dual Magnetron and high-density plasma configuration has been designed specifically for reactive processes



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