웨스트팩

 
Molecular Imprints
Molecular Imprints, Inc. (MII) was founded in Austin, Texas in 2001, spun out of the University of Texas. Molecular Imprints has applied for over 700 patents, resulting in a growing portfolio of over 100 patents issued covering imprint tools, imprint materials and masks/templates, process technology and imprint-specific device designs. Jet and Flash Imprint Lithography, powered by our IntelliJet Drop Pattern Generator Drop Pattern Generation System, is the heart of Molecular Imprints’ advanced nanoimprint technology, allowing precise placement of photoresist on substrates in picoliter quantities, enabling uniform and consistent nanoimprinting of features down to 10nm and below at very low cost. Molecular Imprints delivers this value to customers through integration of a unique set of core competencies and partnerships that cover lithography, precision nanomechanics, fluid dynamics, surface chemistry and materials formulation.
 
 

Technology (J-FIL)
Jet and Flash Imprint Lithography is conceptually based on the ancient art of embossing, updated for the nano-world. Unlike typical imprint technologies that rely on heat to melt thermoplastic solids, J-FIL imprints into a proprietary water-like photopolymer which conforms virtually instantaneously to an imprint mask (template) due to capillary forces. J-FIL uses proprietary inkjet technology and Molecular Imprints IntelliJet Drop Pattern Generator system to deposit picoliter sized drops according to the customers mask/template pattern. This insures a consistent and uniform pattern etch even below 20nm

IMPRIO-1100
The Imprio? 1100 system represents the state of the art in fully automated single-sided, nanoimprint lithography, combining the resolution and CD control of electron beam lithography with the throughput, and operating simplicity of a mask aligner.
The Imprio 1100 can be configured to accept 25mm to 76mm substrates and is ideal for advanced development, pilot production, or full production depending on the options selected. Proven, turnkey lithography processes and qualified template replication capabilities combine to produce a cost effective imprint lithography solution with best in class cost of ownership

IMPRIO-300
The Imprio 300 system represents the next generation in nanoimprint lithography, and is designed with demanding CMOS applications in mind. The Imprio 300 system represents the industry's highest resolution and lowest cost-fo ownership nanoimprint lithography solution for IC prototyping and process development at the 32nm node and beyond.
The Imprio 300 uses Molecular Imprints  Jet and Flash Imprint Lithographytechnology, including IntelliJet Drop Pattern Generator, to place low-viscosity resist only where needed on the substrate. Molecular Imprints technology is superior to spin-on imprint techniques that waste consumables and require the purchase of costly and space-consuming track. The Imprio 300 uses optical masks, resists, and sources to achieve sub-32nm half-pitch resolution, sub-10nm alignment, integrated magnification control, and fully automated wafer and mask loading. Imprio 300 is ideal for process development, advanced device prototyping and cell library development at the 32nm node, 22nm node and beyond.



로고 COPYRIGHT 2011,WESTPAC ALL RIGHT RESERVED