Since its establishment, Litho Tech Japan Corporation has, as a specialist in the field of lithography, offered various lithography-related products, including the development rate analyzer, lithography simulator, coater, developer and advanced process evaluation exposure system, in order to promptly meet customer neweds.

In this rapid innovation, we strive to develop products in a timely manner adequately meeting customer needs and conduct detailed support activities, in order to help customers cope with technological innovation where high density and diversification accelerate in various fields of electronic technology, including those for semiconductors and liquid crystal devices.

RDA-800
(Resist Development analyzer ? Lens Synchronizing Type)
The lens and sample substrate move in synchronization and analysis becomes possible at the moment when the sample substrate enters the developer. This system is excellent for evaluation of samples with fast R_max such as the ArF resist.

RDA-Qz3
(QCM-supporting Resist Development Analyzer)
Development rate measurement and evaluation equipment using the QCM (Quartz Micro-balance) method. You can also evaluate the swelling behavior of the resist being developed.

EUVES-7000
(EUV Analyzer/Exposure System)
This system is equipped with the EQ-10M EUV Source made by Energetiq Technology, Inc. and permits EUV (13.5 nm) exposure. A resist outgas collection function is available as an option. (Exposure area: 10×10 mm)