This is the exposure tool for research and development of photoresists. Stepped exposure permits open frame exposure at up to 25 positions with different exposure conditions. Analyzing the development of the exposed sample using the resist development analyzer, you can accelerate the material development and process development for photoresists. Furthermore, use of the optional outgassing collecting unit permits analysis of the components of outgas from the resist being exposed.
●UVES-2000 (g/i/248 nm-Analyzer/Exposure System)
Equipped with a high-pressure mercury lamp, this system takes light of 436, 365 and 248 nm through the filter to enable exposure. Exposure by broad light is also available. An outgas collection unit and a transmission factor measurement function (ABC parameter measurement) are available as options. (Exposure area: 10×10 mm)
Equipped with an excimer laser, this system takes light of 248 and 193 nm through pulsed gas to enable exposure. An outgas collection unit and a transmission factor measurement function (AB parameter measurement) are available as options. (Exposure area: 10×10 mm)
This system is equipped with the EQ-10M EUV Source made by Energetiq Technology, Inc. and permits EUV (13.5 nm) exposure. A resist outgas collection function is available as an option. (Exposure area: 10×10 mm)
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