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Environics |
| ENVI-Air™ Orthogonal Detection
Ion Mobility Spectrometry (IMS)
- Molecular Acids- HCl, HF, SO2, HNO3, Cl2
Gas Chromatography-Ion Mobility Spectrometry (GC-IMS)
- Molecular Bases- Ammonia, Amines, NMP
Gas Chromatography-Photo Ionization Detector (GC-PID)
- Solvents- PGMEA, IPA, Toluene, Acetone, Alcohols Hydrocarbons |
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Semiconductor AMC Monitors |
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Feature |
Environics ENVI-Air™ System |
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Technology |
GC-IMS, IMS and GC-PID with 1-64 sample points |
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Compounds Monitored |
Molecular Bases- Ammonia, Amines… |
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Molecular Acids- HF, HCl, Cl2, SO2… |
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Organics- solvents, condensables… |
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Detection Range |
0.1-1000 ppb |
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Pre-concentrator (optional) for lower ranges |
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Sample Time |
1-3 minutes (acids, bases & organics) |
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Radioactive License and Wipe Tests Required |
No, exempt Tritium (3-H) source |
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AMC Contaminants
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AMC Class |
Contaminants |
Sources |
Effects |
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Molecular Acids |
HF, HCl, SO2, NOx, Cl2 |
Etch Chambers, Diffusion Furnaces, Wet Benches, CVD |
Hazing of reticles, wafers, optics of exposure & metrology tools, Corrosion of Al & Cu metal lines |
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Molecular Bases |
Ammonia, Amines, NMP |
CVD, HMDS, CMP, slurries, wafer cleaning processes, TiN films deposition, Si3N4 films deposition, photo resist strippers, polymers, epoxies, TMAH decomposition |
Neutralizes photo-acids in resists. Reacts with acid vapors can cause hazing, particle formation, nitrides on wafer surface |
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Molecular Condensables |
PGMEA, HMDS, NMP, Phthalates, Organophosphates |
Outside air, process chemicals, outgassing from filter, sealants, walls, adhesives, floors, wafer shippers, FOUPS, pods flame retardants |
Hazing of exposure tool optics and masks, from silicones & HMDS by-products, Delaminating of PR and ARCs |
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Molecular Dopants |
Boron, Phosphorous, Organo -phosphorous, Arsenic, Antimony |
Degradation of HEPA & ULPA filters, exhaust from RIE, EPI, CVD processes, flame retard. |
Unwanted n- and p- doping of wafers |
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Molecular Metals |
Organo-metallic |
Cross-contamination of wafers, Plastic additives containing metals, metal duct work |
Particulates in air, on wafers |
Integrated Multipoint Sampling System
u Fast Loop Design
u Teflon Rotary Valves
u Minimal Dead Volume
u Rapid Sample Switching
u User Defined Sample Sequencing
u Quick Connects for New Samples
PRODUCTS
l For continuous monitoring of molecular bases, acids and hydrocarbons, these analyzers utilize IMS, GC-IMS or GC-PID to detect the class of compounds in the 0-100 ppb concentration range.
l Uses a new 3H (tritium) source that is exempted from semi-annual wipe tests or government licensing.
ENVI-AirS™ Series Analyzers
ENVI-AMS200™
l For continuous multi-points sampling from 2 to 64 different points.
l Utilizes a fast loop pump design to assure fresh sample is available and dead volume is kept to a minimum.
l All wetted surfaces are Teflon, including pump heads, connectors and valves.
l Rotary valve design keeps moving parts and maintenance to a minimum.
l Portable IMS MINI for clean room surveys and mapping hotspots
APPLICATION
Semiconductor / LCD manufacturing Fab
Gas, Oil and Chemical Plant
Industrial Market:
- Process Gas Measurement
- Ambient Air Measurement
- Stack Gas Measurement
- Environmental Monitoring
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