웨스트팩

 
PR Coater & Developer
This is the resist coat, develop and bake system for which we have uniquely forwarded development of equipment that is applicable to all categories of wafer production processes from research and development to mass production. We strive to offer highly flexible design to meet customer needs and have received favorable comments from many customers for our design concept that customized specifications are no longer special orders.
 
 
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Model CB-50
(Fully Automatic Coater/Bake System)

Automatic resist coat/bake system. This system is equipped with a resist coat module, bake module, cooling module, and substrate transfer robot.
For options to improve the coating accuracy, you can also install selectable temperature control equipment such as the atmosphere temperature and humidity controller in the coating chamber, resist temperature controller and spin motor temperature controller. The task management program to minimize variations in standby time for substrate processing permits variance control of the heat history. This is the highly flexible high-performance system which can accommodate up to the maximum of 300 mm in diameter for substrate size and also handle irregular substrates.


Model DB-50
(Fully Automatic Develop/Bake System)

Automatic resist develop/bake system. This system is equipped with a resist develop module, bake module, cooling module, and substrate transfer robot.
For options to improve the developing accuracy, you can also install selectable temperature control equipment such as the developer controller and spin motor temperature controller. The task management program to minimize variations in standby time for substrate processing permits variance control of the heat history. This is the highly flexible high-performance system which can accommodate up to the maximum of 300 mm in diameter for substrate size and also handle irregular substrates.


Model Dual-1000
(Fully Automatic Coat/Develop/Bake System)

Automatic resist coat/develop/bake system. This system is equipped with a resist coat module, resist develop module, bake module, cooling module, and substrate transfer robot. The system integrates Model CB-50 and Model DB-50 into one unit.



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