Phase Shift Focus Monitor

With over 600 users worldwide, Benchmark Technologies’ Phase Shift Focus Monitor (PSFM) Test Reticle is the standard by which lithographers evaluate scanner and stepper focus and lens performance. Using patented technology, the PSFM pattern is comprised of a traditional box-in box structure that can be easily measured on industry standard overlay tools common to most wafer fabrication facilities. The phase-shifting of this pattern cause the inner box to become displaced vs. the outer box in a defocus condition. The use of PFSM allows focus to be monitored with a resist-based method using a single wafer lot thus saving hours of precious lithography tool time that would be consumed by traditional OEM methods.

PSFM can also be used as an engineering tool to troubleshoot focus problems. By analyzing the target displacement using our PSFM Data! software, engineers can develop a thorough understanding of the z-axis conditions of their lithography system and can extract lens, chuck and topographic contributions to focus. Numerous technical studies have been published by many leading industry researchers showing the power of the PSFM as an analysis tool. A sampling of these papers can be provided upon request through our Contact Us page

Universal Matching Reticles

Benchmark Technologies' Universal Matching Reticles are high precision single and multiple matching sets used to measure system grid and field matching errors.

Universal Matching Reticles are used by leading chip and lithography equipment manufacturers to match like or differing litho tools within a fab or fab-to-fab. Universal Matching Reticles are also used to qualify new lithography tools and assess matching to the legacy tool base.

With an installed base of over 600units, Universal Matching Reticles are available for virtually all lithography tool types and models including ASML, Nikon, Canon and Ultratech.

Visual Diagnostic Test Reticles

Benchmark's Visual Diagnostic Test Reticles are widely accepted and endorsed by both semiconductor manufacturers and equipment vendors, to rapidly determine stepper best focus without the use of a microscope. With these reticles, optimum focus can be found more quickly and with half the variability of conventional microscope linewidth measurement methods.

Resolution Test Reticle

Benchmark Technologies Resolution Test Reticles contain unique submicron resolution and process control test patterns designed for use with, ASML, Nikon, Canon scanners and other legacy lithography systems. The basic resolution cell shown here can be customized and scaled to the size range of interest to the user.

Multi-Transmission Mask

Benchmark Technologies‘ multi-transmission masks are used in 1:1 contact, proximity or projection printing to identify optimum dose with a single exposure.

The mask provides multiple exposures simultaneously on the substrate, allowing the user to rapidly pinpoint the optimum dose. Available in plate sizes for most contact and proximity printers, this reticle can save hours of set-up time.

Custom Test Reticles

Benchmark’s broad and sustained experience in developing the test reticles that are now part of our standard products portfolio gives us a distinct advantage in developing custom test reticles. Our relationships with both the OEM lithography and metrology tool manufacturers and many of the resist and other materials providers has broadened our understanding about what is possible within the manufacturing partner base we have developed. Some of the custom reticles we have developed over the years have been used to;