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Foothill Instruments
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Film Thickness Measurement System
www.foothill-instruments.com
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EUV Technology
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EUV Mask Reflotmeter System
EUV Outgoing Gass Analyzer System
www.euvl.com
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Molecular Imprints
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Nanoimprint Lithography System
www.molecularimprints.com
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Litho Tech Japan
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Resist Analysis system
Lithography Process System
www.ltj.co.jp
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RDA(ARM) Series
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| The Resist Development Analyzer is the most-advanced 18-channel development rate analysis evaluation equipment. Using this system, you can promptly carry out developing characteristic analysis such as measurement of photoresists development rates and calculation of contrast curves and sensitivity. You can also accurately determine resist model parameters required for the lithography simulator.
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