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PR Coater & Developer
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Automatic Coater/Developer/Bake system
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Wafer Flatness Measurement
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- Si, Sapphire, GaAs, SiC, GaN, LN, Quartz etc
- Sawing, Lapping, Polishing
- Process Development and IQC&OQC
- UltraSort150&200, FM200Wafer, FM-MSP300
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Mask(Reticle) Flatness Measurement
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- Quartz(Glass) non-contact flatness measurement system
- Blank, Pellicle mounted mask and EUV mask
- FM200Mask, UltraFlat
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Single Wafer Wet Processing
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- Cleaning Processors
- Solvent Processors
- Wet Etch Processors
- Developer
- Spin & Spray Coater with Bake Processing
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LED Metal Lift Off
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Dry-in/-out Solvent Strip and Lift-off Processing
SSEC combines immersion batch soak and single wafer spray solvent processing in one completely enclosed, fully automatic system. The chart below includes
applications for SI wafers and III-V semiconductors including GaAs, InP, GaN, GaP, sapphire, and SiC and glass wafers.
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