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RDA(ARM) Series

Measurement and analysis of development rates
Responds to resists on the Si substrate, multilayer substrate, Al substrate, and ARC.

Developing characteristic analysis
Measurement of γ value, Eth and discrimination curves and calculation of development contrast (tanθ)

Determination of accurate model parameters
Determination of development parameters, diffusion lengths, and surface insoluble parameters

Creation of data tables and transfer of data to the simulator

Automatic supply and discharge system for developer

Automatic insertion of wafers and substrate sizes of 4 to 8 inches (12 inches compatible)

	●RDA-760 (Resin Analyzer) Resin solution rate measurement and evaluation equipment also permitting a one-channel monitor. This system can also be used for quality control.

	●RDA-790 (Resist Development Analyzer-Fixed Lens Type) Standard machine with an 18-channel monitor. Either 470 nm or 950 nm can be selected for monitor wave length.

	●RDA-800 (Resist Development analyzer Lens Synchronizing Type) The lens and sample substrate move in synchronization and analysis becomes possible at the moment when the sample substrate enters the developer. This system is excellent for evaluation of samples with fast R_max such as the ArF resist.

	●RDA-Qz3 (QCM-supporting Resist Development Analyzer) Development rate measurement and evaluation equipment using the QCM (Quartz Micro-balance) method. You can also evaluate the swelling behavior of the resist being developed